The Most Suitable Clearance in MCF (Magnetic Compound Fluid) Polishing
DOI:
https://doi.org/10.53555/nnmce.v3i3.322Keywords:
MCF (Magnetic Compound Fluid), polishing, most suitable clearance, polished materialAbstract
Prof. Shimada has demonstrated experimentally that the polishing effect using our developed intelligent fluid, magnetic compound fluid (MCF), is greater than that using previously developed intelligent fluids, i.e., magnetic fluid (MF) and magneto-rheological fluid (MRF). Shimada succeeded in float polishing with a large clearance utilizing a newly developed magnetic responsive fluid, MCF, which was improved by the addition of a-cellulose, thereby achieving a clearance as great as 8mm. He also clarified the mechanism of the new polishing technique. A comparison of the MCF polishing effect with those of techniques using the ordinary magnetic responsive fluids, MF and MRF, showed the polishing effect of MCF to be greater than those of MF and MRF. The MCF polishing technique is applicable to many types of polishing, widening the variety of the uses of magnetic float polishing (MFP). However, while clearance to8mm is possible, this may not be the most suitable value. In this study, we clarified the most suitable value for MCF abrasion experimentally.
References
Shimada K, Fujita T, Oka H, Akagami Y and Kamiyama S 2001 Hydrodynamic and magnetized characteristics of MCF (magnetic compound fluid) Transactions of the Japan Society of Mechanical Engineers 664-67(B) 122-128
Shimada K, Akagami Y, Fujita T, Miyazaki T, Kamiyama S and Shibayama A 2002 Characteristics of MCF (Magnetic Compound Fluid) in a rotating rheometer Journal of Magnetism Magnetic and Materials 252 235-237
Shimada K, Fujita T, Kamiyama S and Akagami Y Experimental investigation of effects by various factors on shear flow characteristics of magnetic compound fluid (MCF) and its application 2002 Journal of the Japan Society of Applied Electromagnetics and Mechanics 10-1 67-72
Fujita T and Shimada K 2003 Characteristics and application of magnetorheological fluid Recent Research Development Magnetism and Magnetic Materials 1 463-479
Shimada K, Akagami Y, Kamiyama S, Fujita T, Miyazaki T and Shibayama A 2002 New microscopic polishing with magnetic compound fluid (MCF) Journal of Intelligent of Material Systems Structure, 13-7 405-408
Shimada K, Wu Y, Wong Y C, Fujita T, Miyazaki T and Shibayama A 2002 Experimental investigation of the effect of the MPL (magnetic polishing liquid) on surface finishing Proceedings of SPIE 4936 312-320
Shimada K, Wu Y, Matsuo Y and Yamamoto K 2005 Float polishing technique using new tool consisting of micro magnetic clusters Journal of Material Processing Technology 162-163 690-695
Wong Y C, Wu Y, Shimada K and Kato M 2002 The effects of polishing with magnetic compound fluid Proceedings of 5th International Conference on Behavior of Materials in Machining 293-296
Komanduri R, Umehara N and Raghunandan M 1996 On the possibility of chemo-mechanical action in magnetic float polishing of silicon nitride Transactions of ASME, Journal of Tribology 118-4 721-727
Childs T H C and Moss D J 2000 Grinding ratio and cost issues in magnetic and non-magnetic fluid grinding Annals of the CIRP 49-1 261-264
Raghunandan M, Umehara N, Noori-Khajavi A, Komanduri R 1997 Magnetic float polishing of ceramics Transactions of ASME, Journal of Manufacture Science Engineering 119-4 520-528
Jiang M and Komanduri R 1997 Application Taguchi method for optimization of finishing conditions in magnetic float polishing (MFP) Wear 213 59-71
Arrasmith S R, Kozhinova I A, Gregg L L, Shorey A B, Romanofsky H J, Jacobs S D, Golini D, Kordonski W I, Hogan S and Dumas P 1999 Details of the polishing spot in magnetorheological finishing (MRF) Proceedings of SPIE 3782 92-100
Komandiru R and Golini D 1999 Fundamentals of magneto-rheological fluid utilization in high precision finishing Journal of Intelligent Material Science Structure 10 683-689
Shorey A B, Jacobs S D, Kordonski W I and Gans R F 2001 Experiments and observations regarding the mechanisms of glass removal in magnetorheological finishing Appied. Optics 40-1 20-33
Shimada K, Miyazaki T, Shibayama A and Fujita T 2003 Extraction of magnetic clusters selfassembled by a magnetic field Smart Materials and Structures 12-2 297-303
Published
Issue
Section
License
This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.
You are free to:
- Share — copy and redistribute the material in any medium or format for any purpose, even commercially.
- Adapt — remix, transform, and build upon the material for any purpose, even commercially.
- The licensor cannot revoke these freedoms as long as you follow the license terms.
Under the following terms:
- Attribution — You must give appropriate credit , provide a link to the license, and indicate if changes were made . You may do so in any reasonable manner, but not in any way that suggests the licensor endorses you or your use.
- No additional restrictions — You may not apply legal terms or technological measures that legally restrict others from doing anything the license permits.
Notices:
You do not have to comply with the license for elements of the material in the public domain or where your use is permitted by an applicable exception or limitation .
No warranties are given. The license may not give you all of the permissions necessary for your intended use. For example, other rights such as publicity, privacy, or moral rights may limit how you use the material.
